US Patent Issued to V TECHNOLOGY on Oct. 14 for "Focused charged particle beam apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,567, issued on Oct. 14, was assigned to V TECHNOLOGY Co. LTD. (Kanagawa, Japan).

"Focused charged particle beam apparatus" was invented by Michinobu Mizumura (Yokohama, Japan), Toshinari Arai (Yokohama, Japan), Takanori Matsumoto (Yokohama, Japan) and Takuro Takeshita (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A focused charged particle beam apparatus which includes a support which supports a substrate to be processed and a focused charged particle beam column equipped with a differential pumping device movable to a location facing a given area of a process target surface of the substrate. The support bears only a periphery of t...