US Patent Issued to V TECHNOLOGY on Nov. 25 for "Projection exposure device and projection exposure method" (Japanese Inventor)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,481,221, issued on Nov. 25, was assigned to V TECHNOLOGY Co. LTD. (Yokohama, Japan).

"Projection exposure device and projection exposure method" was invented by Yoshiyuki Enomoto (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A projection exposure apparatus includes a mask mark illumination light source irradiating a mask mark with exposure light itself or a first alignment light having substantially the same wavelength as the exposure light, and an alignment unit having a work mark illumination light source irradiating a work mark with second alignment light having a wavelength different from the wavelength of the exposure light, an im...