US Patent Issued to V TECHNOLOGY on Jan. 27 for "Process apparatus including differential pumping device and focused ion beam column" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,537,164, issued on Jan. 27, was assigned to V TECHNOLOGY Co. LTD. (Kanagawa, Japan).

"Process apparatus including differential pumping device and focused ion beam column" was invented by Michinobu Mizumura (Yokohama, Japan), Toshinari Arai (Yokohama, Japan), Takanori Matsumoto (Yokohama, Japan) and Takuro Takeshita (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A process apparatus includes a differential pumping device having a head which has a plurality of annular grooves in a surface which faces a substrate to be processed. An orifice is formed inside an innermost one of the annular grooves and defines a processing space for processin...