US Patent Issued to Ushio Denki on Oct. 7 for "Detection apparatus, alignment microscope, and exposure apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,475, issued on Oct. 7, was assigned to Ushio Denki K.K. (Tokyo).

"Detection apparatus, alignment microscope, and exposure apparatus" was invented by Naoya Sohara (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A detection apparatus includes: an alignment microscope that captures an image of a mask mark and an image of a workpiece mark; and a position detector that detects a position of the mask mark and a position of the workpiece mark on the basis of those images. The alignment microscope includes an imaging unit, a beam splitter that splits each of the first light and the second light, and one or more aberration correction lenses. The beam sp...