US Patent Issued to Ushio Denki on Nov. 25 for "Illumination optical system, exposure apparatus, irradiation method, and component manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,481,219, issued on Nov. 25, was assigned to Ushio Denki K.K. (Tokyo).

"Illumination optical system, exposure apparatus, irradiation method, and component manufacturing method" was invented by Osamu Osawa (Tokyo) and Koichi Ito (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An illumination optical system that irradiates a target object with light from a light source unit includes an integrator optical system, a condenser lens, and a bandpass filter. The integrator optical system is disposed on an optical path of the light emitted from the light source unit and uniformizes an illuminance distribution of the light with which the target object is to ...