ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,077, issued on March 25, was assigned to USHIO DENKI K.K. (Tokyo).
"Work stage and exposure apparatus" was invented by Shunta Sugisaki (Tokyo) and Yohei Nawaki (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein is a work stage for holding an organic substrate and an exposure apparatus using the work stage. The work stage comprises: a base having a recess into which vacuum is supplied; a number of substrate holding sections arranged inside the recess and configured to hold an approximately entire surface of the organic substrate; and an intake hole configured to supply vacuum into the recess and allow the substrate holding sectio...