US Patent Issued to UP CHEMICAL on June 3 for "Ruthenium precursor composition, preparation method therefor, and formation method for ruthenium-containing film using same" (South Korean Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,319,705, issued on June 3, was assigned to UP CHEMICAL Co. LTD. (Pyeongtaek-si, South Korea).

"Ruthenium precursor composition, preparation method therefor, and formation method for ruthenium-containing film using same" was invented by Yun Tae Kim (Pyeongtaek-si, South Korea), Won Seok Han (Pyeongtaek-si, South Korea), Yoon A Park (Pyeongtaek-si, South Korea) and Wonyong Koh (Pyeongtaek-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A compound represented by chemical formula 4 is reacted with an alkali metal carbonate salt represented by chemical formula 5 and 1,5-hexadiene, in an organic solvent, and by controlling a compound represented...