US Patent Issued to UP CHEMICAL on Jan. 13 for "Yttrium/lanthanide metal precursor compound, composition for forming film including the same, and method of forming yttrium/lanthanide metal-containing film using the same" (South Korean Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,921, issued on Jan. 13, was assigned to UP CHEMICAL Co. LTD. (Pyeongtaek-si, South Korea).

"Yttrium/lanthanide metal precursor compound, composition for forming film including the same, and method of forming yttrium/lanthanide metal-containing film using the same" was invented by Jin Sik Kim (Pyeongtaek-si, South Korea), Myeong-Ho Park (Suwon-si, South Korea), Dong Hwan Ma (Seoul, South Korea), Yun Gyeong Yi (Guri-si, South Korea) and Jun Hwan Choi (Goyang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to an yttrium/lanthanide metal precursor compound, a precursor composition for depositing an yttrium/l...