US Patent Issued to UP CHEMICAL on Jan. 13 for "Thermally stable ruthenium precursor composition, and method for forming ruthenium-containing film" (South Korean Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,626, issued on Jan. 13, was assigned to UP CHEMICAL Co. LTD. (Pyeongtaek-si, South Korea).

"Thermally stable ruthenium precursor composition, and method for forming ruthenium-containing film" was invented by Wonyong Koh (Daejeon, South Korea), Jin Sik Kim (Pyeongtaek-si, South Korea) and Dae-Young Kim (Pyeongtaek-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application relates to: a ruthenium precursor compound for forming a film having high thermal stability; a precursor composition for forming a film, comprising the ruthenium precursor compound; and a method for forming a ruthenium-containing film using the precursor ...