US Patent Issued to University of Science and Technology Beijing on Oct. 28 for "Process for evaluating corrosion inhibitor based on high-throughput corrosion chip" (Chinese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,455,225, issued on Oct. 28, was assigned to University of Science and Technology Beijing (Beijing).

"Process for evaluating corrosion inhibitor based on high-throughput corrosion chip" was invented by Dawei Zhang (Beijing), Lingwei Ma (Beijing), Chenhao Ren (Beijing), Jinke Wang (Beijing) and Xiaogang Li (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure discloses a process for evaluating a corrosion inhibitor based on a high-throughput corrosion chip. In the present disclosure, a high-throughput corrosion chip is first prepared by using a chip spotter, and only a corrosion inhibitor and a corrosive substance need to be spott...