US Patent Issued to University of Notre Dame du Lac on Dec. 16 for "Scalable high-throughput isoelectric fractionation platform for extracellular nanocarriers" (Indiana Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,498,349, issued on Dec. 16, was assigned to University of Notre Dame du Lac (South Bend, Ind.).

"Scalable high-throughput isoelectric fractionation platform for extracellular nanocarriers" was invented by Satyajyoti Senapati (South Bend, Ind.), Hsueh-Chia Chang (South Bend, Ind.), Himani Sharma (South Bend, Ind.) and David Go (South Bend, Ind.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Described herein is a bias-free high-throughput and high-yield continuous isoelectric fractionation (CIF) nanocarrier fractionation technique based on distinct isoelectric points. The nanocarrier fractionation platform is enabled by a robust and tunable linear pH prof...