US Patent Issued to UNIVERSITEIT ANTWERPEN on Dec. 23 for "Reducing image artefacts in electron microscopy" (Belgian Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,505,516, issued on Dec. 23, was assigned to UNIVERSITEIT ANTWERPEN (Antwerp, Belgium).

"Reducing image artefacts in electron microscopy" was invented by Sandra Van Aert (Hove, Belgium) and Ivan Pedro Lobato Hoyos (Antwerp, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a method, for training an artificial neural network (ANN) to reduce noise and/or artefacts in an electron microscopy image, a plurality of training image pairs is generated. For each pair, an undistorted synthetic specimen image and a distorted image are created by simulating additional noise and/or artefact features. The ANN is trained, in which the distorted images are used a...