ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,428,532, issued on Sept. 30, was assigned to UNITIKA Ltd. (Osaka, Japan).
"Method for producing polyamide resin film" was invented by Akiko Kurosawa (Uji, Japan) and Atsuko Noda (Uji, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "[Problem] To provide a method for producing a polyamide resin film by using a polyamide resin obtained through polymerization of a regenerated monomer used as a recycled material. [Solution] Provided is a method for producing a polyamide resin film, including: (1) a step of producing a monomer from a raw material (A) for depolymerization, (2) a step of producing a polyamide resin (B) through polymerization using a raw m...