ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,866, issued on Sept. 16, was assigned to United Semiconductor (Xiamen) Co. Ltd. (Fujian, China).
"Overlay mark" was invented by Xia Yuan (Fujian, China), Cheng Hua Wu (Fujian, China) and Wen Yi Tan (Fujian, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "An overlay mark includes a bottom overlay mark on a bottom level, a middle overlay mark on a middle level, and a top overlay mark on a top level. The bottom overlay mark, the middle overlay mark and the top overlay mark vertically overlap with one another."
The patent was filed on May 26, 2022, under Application No. 17/824,909.
*For further information, including images, charts and tables, p...