ALEXANDRIA, Va., June 5 -- United States Patent no. 12,276,020, issued on April 15, was assigned to United Semiconductor (Xiamen) Co. Ltd. (Fujian, China).
"Semiconductor cleaning step" was invented by William Zheng (Fujian, China), Shih-Feng Su (Kaohsiung, Taiwan), Chih-Chien Huang (Tainan, Taiwan), Wen Yi Tan (Fujian, China) and Ji He Huang (Suzhou, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides a semiconductor cleaning step, which comprises the following steps: providing a chamber with a bottom surface and a sidewall, the chamber contains a heater on the bottom surface, performing a first deposition step to leave a residual layer on the sidewall of the chamber, performing a ca...