US Patent Issued to United Microelectronics on Sept. 30 for "Method of forming a layout pattern and photomask" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,762, issued on Sept. 30, was assigned to United Microelectronics Corp. (Hsinchu, Taiwan).

"Method of forming a layout pattern and photomask" was invented by Chia-Chen Sun (Kaohsiung, Taiwan), En-Chiuan Liou (Tainan, Taiwan) and Song-Yi Lin (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes providing a layout pattern to a computer system. The layout pattern includes a first pattern, a second pattern, and a third pattern. A central line defined by connecting a line end of the second pattern and a line end of the third pattern overlaps with a middle portion of the first pattern. An optical proximity correction (OPC) is pe...