ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,426,353, issued on Sept. 23, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu, Taiwan).
"Semiconductor structure" was invented by Chang-Po Hsiung (Hsinchu, Taiwan), Ching-Chung Yang (Hsinchu, Taiwan), Shan-Shi Huang (Hsinchu, Taiwan) and Wen-Fang Lee (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure comprises a substrate having a first well region of a first conductive type, a second well region of a second conductive type, and a junction between the first well region and the second well region. The first conductive type and the second conductive type are complementary. A plurality of first dummy structure...