ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,867, issued on Sept. 16, was assigned to United Microelectronics Corp. (Hsinchu, Taiwan).
"Overlay target and overlay method" was invented by Hui Liu (Singapore).
According to the abstract* released by the U.S. Patent & Trademark Office: "An overlay target includes a plurality of working zones, a plurality of holes in each of the working zones, and a first layer filling in the plurality of holes. The plurality of holes are not filled up by the first layer, and a plurality of spaces are reserved in the plurality of holes."
The patent was filed on Oct. 7, 2022, under Application No. 17/961,575.
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