ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,468,219, issued on Nov. 11, was assigned to United Microelectronics Corp. (Hsinchu, Taiwan).
"Method for forming photomask" was invented by Pin Han Huang (Tainan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming a photomask is provided. The method includes: providing a photomask pattern for a target pattern; obtaining a first light intensity curve according to the photomask pattern by simulation; subjecting the first light intensity curve to a check on light intensities at pattern edges of the target pattern to define a light intensity error; retargeting the photomask pattern to reduce the light intensity error; identifying a l...