ALEXANDRIA, Va., June 16 -- United States Patent no. 12,310,071, issued on May 20, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu, Taiwan).
"Semiconductor structure and fabrication method thereof" was invented by Chia-Ling Wang (Tainan, Taiwan), Ping-Hung Chiang (Tainan, Taiwan), Wei-Lun Huang (Tainan, Taiwan), Chia-Wen Lu (Tainan, Taiwan) and Ta-Wei Chiu (Changhua County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes a substrate having a first device region and a second device region in proximity to the first device region. A trench isolation structure is disposed in the substrate between the first device region and the second device region. The trench iso...