ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,212, issued on March 25, was assigned to United Microelectronics Corp. (Hsinchu, Taiwan).
"Manufacturing method of semiconductor structure" was invented by Zhenhai Zhang (Singapore).
According to the abstract* released by the U.S. Patent & Trademark Office: "A manufacturing method of the semiconductor structure including the following is provided. Gate structures are formed on a substrate. Each gate structure includes a gate, a first spacer, and a second spacer. The gate is disposed on the substrate. The first spacer is disposed on a sidewall of the gate. The second spacer is disposed on the first spacer. In a region between two adjacent gate structures, the first spacers are se...