US Patent Issued to United Microelectronics on March 25 for "Lithography system and method of detecting fluid leakage in liquid storage tank of the same" (Taiwanese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,657, issued on March 25, was assigned to United Microelectronics Corp. (Hsinchu, Taiwan).

"Lithography system and method of detecting fluid leakage in liquid storage tank of the same" was invented by Zhi Fan Sun (Kaohsiung, Taiwan), Kuo Feng Huang (Tainan, Taiwan), Ming Hsien Chung (Tainan, Taiwan), Hua-Wei Peng (Hsinchu County, Taiwan) and Chih Chung Kuo (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A lithography system includes an immersion lithographic apparatus, a fluid supply device, and a sensor. The fluid supply is configured to supply fluid to the immersion lithographic apparatus. The fluid supply device includes at least o...