ALEXANDRIA, Va., July 23 -- United States Patent no. 12,369,391, issued on July 22, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu, Taiwan).
"Layout pattern of semiconductor varactor and forming method thereof" was invented by Ching-Wen Hung (Tainan, Taiwan), Peng-Hsiu Chen (Tainan, Taiwan), Su-Ming Hsieh (Tainan, Taiwan) and Ying-Ren Chen (Changhua County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides a layout pattern of a semiconductor varactor, which comprises a plurality of varactor units arranged on a substrate, wherein each varactor unit comprises a plurality of fin structures arranged in parallel with each other, a plurality of gate structures arranged in parall...