US Patent Issued to UNITED MICROELECTRONICS on Jan. 27 for "Photomask inspection method using image inensity ratio" (Taiwanese Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,536,645, issued on Jan. 27, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu, Taiwan).

"Photomask inspection method using image inensity ratio" was invented by Pai-Chi Chen (Pingtung County, Taiwan), Chian-Ting Huang (Tainan, Taiwan) and Yung-Feng Cheng (Kaohsiung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a photomask inspection method, including steps of defining an anchor ratio, providing a photomask and measuring the photomask to obtain a measured ratio, wherein the measured ratio is equal to a value of an image intensity extremum divided by an image intensity threshold or is equal to a value of the i...