US Patent Issued to UNITED MICROELECTRONICS on Dec. 9 for "Radiofrequency filter and manufacturing method thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,445, issued on Dec. 9, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu, Taiwan).

"Radiofrequency filter and manufacturing method thereof" was invented by Chien-Yi Lee (Hsinchu, Taiwan), Sheng-Huei Dai (Taitung County, Taiwan) and Chen-Wei Pan (Hsinchu County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A radiofrequency filter includes a substrate, an isolation structure, an electrically conductive structure, a spacer structure, a dielectric layer, a patterned electrically conductive film, a first contact structure, and a second contact structure. The isolation structure is disposed in the substrate. The electrically conductive struc...