US Patent Issued to UNITED MICROELECTRONICS on Dec. 9 for "Control method of multi-stage etching process and processing device using the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,376, issued on Dec. 9, was assigned to UNITED MICROELECTRONICS CORP. (Hsinchu, Taiwan).

"Control method of multi-stage etching process and processing device using the same" was invented by Liang Ju Wei (Chiayi, Taiwan), Chung-Yi Chiu (Tainan, Taiwan), Zhen Wu (Kaohsiung, Taiwan), Hsuan-Hsu Chen (Tainan, Taiwan) and Chun-Lung Chen (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A control method of a multi-stage etching process and a processing device using the same are provided. The control method of the multi-stage etching process includes the following step S. A stack information of a plurality of hard mask layers is set. An etching t...