ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,513,997, issued on Dec. 30, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu, Taiwan).

"Layout pattern of semiconductor cell and forming method thereof" was invented by Ching-Wen Hung (Tainan, Taiwan), Peng-Hsiu Chen (Tainan, Taiwan), Su-Ming Hsieh (Tainan, Taiwan) and Chun-Hsien Lin (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides a layout pattern of a semiconductor cell, which comprises a substrate with a first L-shaped MESA region and a second L-shaped MESA region, wherein the shapes of the first L-shaped MESA region and the second L-shaped MESA region are mutually inverted by 180 degrees, a first high elec...