ALEXANDRIA, Va., April 9 -- United States Patent no. 12,274,081, issued on April 8, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu, Taiwan).
"Semiconductor structure and method for forming the same" was invented by Ming-Hua Chang (Tainan, Taiwan), Po-Wen Su (Kaohsiung, Taiwan) and Chih-Tung Yeh (Taoyuan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming a semiconductor structure includes the steps of forming a stacked structure on a substrate, forming an insulating layer on the stacked structure, forming a passivation layer on the insulating layer, performing an etching process to form an opening through the passivation layer and the insulating layer to expose a portion of t...