US Patent Issued to UNIJET on July 22 for "Apparatus and method for forming a resist fine pattern" (South Korean Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,365,190, issued on July 22, was assigned to UNIJET Co. LTD. (Gyeonggi-Do, South Korea).

"Apparatus and method for forming a resist fine pattern" was invented by Seog-soon Kim (Gyeonggi-do, South Korea), Jong-gyun Lee (Gyeonggi-do, South Korea) and Hee-jun Han (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming a resist fine pattern uses inkjet printing for printing an ink along a path to form a resist fine pattern on a substrate having the same surface energy. The method includes an ejecting step of simultaneously discharging a photocurable resist ink and a partition-forming ink that are spaced from each other o...