US Patent Issued to UDMTEK on July 1 for "Master pattern generation method based on control program analysis and training method for cycle analysis model" (South Korean Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,346,084, issued on July 1, was assigned to UDMTEK (Suwon-Si, South Korea).

"Master pattern generation method based on control program analysis and training method for cycle analysis model" was invented by Gi Nam Wang (Yongin-Si, South Korea), Jun Pyo Park (Suwon-Si, South Korea), Yeon Dong Kim (Hwaseong-Si, South Korea), Nam Ki Kim (Suwon-Si, South Korea), Hee Chan Yang (Suwon-Si, South Korea), Yoon Woo Ha (Suwon-Si, South Korea) and Seung Jong Jin (Suwon-Si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure discloses a master pattern generation method which is a major pattern in a repeated cycle by analyzing programmable ...