US Patent Issued to TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH on July 1 for "Device and method for regulating and controlling incident angle of light beam in laser interference lithography" (Chinese Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,346,030, issued on July 1, was assigned to TSINGHUA UNIVERSITY (Beijing) and BEIJING U-PRECISION TECH Co. LTD. (Beijing).

"Device and method for regulating and controlling incident angle of light beam in laser interference lithography" was invented by Leijie Wang (Beijing), Yu Zhu (Beijing), Ming Zhang (Beijing), Rong Cheng (Beijing), Yuezhu Yang (Beijing), Xin Li (Beijing) and Kaiming Yang (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A device and a method for regulating and controlling an incident angle of a light beam in a laser interference lithography process are disclosed. The device comprises: a beam splitter prism between a first lens a...