US Patent Issued to TOSOH on May 6 for "Photocrosslinkable polymer, insulating film, planarization film, lyophilic/liquid repellent patterned film, and organic field effect transistor device comprising same" (Japanese Inventors)

ALEXANDRIA, Va., June 10 -- United States Patent no. 12,291,587, issued on May 6, was assigned to TOSOH Corp. (Shunan, Japan).

"Photocrosslinkable polymer, insulating film, planarization film, lyophilic/liquid repellent patterned film, and organic field effect transistor device comprising same" was invented by Hiroshi Yamakawa (Yokkaichi, Japan), Shinya Oku (Yokkaichi, Japan), Shohei Yumino (Yokkaichi, Japan), Junghwi Lee (Yokkaichi, Japan) and Fumiaki Katagiri (Yokkaichi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a resin which is excellent in terms of solubility in common solvents, crosslinking temperature, time required for crosslinking, solvent resistance (cracking resistance), brea...