US Patent Issued to TOSOH, TOSOH SPECIALITY MATERIALS on Aug. 12 for "Sputtering target, method for producing same, and method for producing sputtering film using sputtering target" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,385,126, issued on Aug. 12, was assigned to TOSOH Corp. (Yamaguchi, Japan) and TOSOH SPECIALITY MATERIALS Corp. (Yamagata, Japan).

"Sputtering target, method for producing same, and method for producing sputtering film using sputtering target" was invented by Daiki Shono (Ayase, Japan), Taiga Kondo (Ayase, Japan), Masami Mesuda (Ayase, Japan), Kenichi Itoh (Yamagata, Japan) and Koichi Hanawa (Yamagata, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A sputtering target includes crystal grains, has a content of an amorphous phase of 3% by volume or less, and contains at least one metal selected from the group consisting of chromium, molybdenum, and ...