US Patent Issued to TOSOH, National Institute for Materials Science on March 11 for "Multilayer film structure and method for producing same" (Japanese Inventors)

ALEXANDRIA, Va., March 12 -- United States Patent no. 12,247,297, issued on March 11, was assigned to TOSOH Corp. (Shunan, Japan) and National Institute for Materials Science (Tsukuba, Japan).

"Multilayer film structure and method for producing same" was invented by Yuya Tsuchida (Ayase, Japan), Yuya Suemoto (Ayase, Japan), Yoshihiro Ueoka (Ayase, Japan), Masami Mesuda (Ayase, Japan), Hideto Kuramochi (Ayase, Japan), Takahiro Nagata (Tsukuba, Japan), Liwen Sang (Tsukuba, Japan) and Toyohiro Chikyow (Tsukuba, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides: a multilayer film structure which has high crystallinity and planarity; and a method for producing this multilayer fil...