US Patent Issued to TORAY ADVANCED MATERIALS KOREA on May 6 for "Gas barrier aluminum deposition film and preparation method thereof" (South Korean Inventors)

ALEXANDRIA, Va., June 10 -- United States Patent no. 12,291,774, issued on May 6, was assigned to TORAY ADVANCED MATERIALS KOREA INC. (Gyeongsangbuk-do, South Korea).

"Gas barrier aluminum deposition film and preparation method thereof" was invented by Seung Hun Han (Gyeongsangbuk-do, South Korea), Kil Joong Kim (Gyeongsangbuk-do, South Korea) and In Seek Chung (Gyeongsangbuk-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a gas-barrier aluminum deposition film according to one embodiment of the present invention, a seed coating layer containing functional groups of at least one type selected from among a hydroxyl group (-OH), an amine group (-NH), and a carboxylic acid group (-COOH) is for...