US Patent Issued to TOPPAN on Sept. 30 for "Method for producing infrared light cut filter, filter for solid-state imaging device, and solid-state imaging device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,638, issued on Sept. 30, was assigned to TOPPAN Inc. (Tokyo).

"Method for producing infrared light cut filter, filter for solid-state imaging device, and solid-state imaging device" was invented by Reiko Iwata (Taito-ku, Japan), Yuri Nagai (Taito-ku, Japan) and Yasutake Akeno (Taito-ku, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing an infrared light cut filter, including forming an infrared light cut layer comprising an infrared light absorbing dye, forming a protective layer on the infrared light cut layer which provides protection against a stripping solution, forming a resist pattern on the protective layer, pattern...