US Patent Issued to TOPPAN on March 18 for "Photoelectric conversion device, imaging device, and imaging system" (Japanese Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,255,216, issued on March 18, was assigned to TOPPAN Inc. (Tokyo).

"Photoelectric conversion device, imaging device, and imaging system" was invented by Tomohiro Nakagome (Taito-ku, Japan) and Yu Ookubo (Taito-ku, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photoelectric conversion device including a substrate including a charge generation region, a dielectric layer formed on the substrate, and a phase adjustment layer formed on the dielectric layer and having an upper surface and a lower surface. In a cross-sectional view of the photoelectric conversion device, a first plane extends parallel to the substrate in contact with the upper surface...