ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,534,585, issued on Jan. 27, was assigned to TOPPAN INC. (Tokyo).
"Gas barrier film and method for producing the same" was invented by Junichi Kaminaga (Tokyo), Ryo Takei (Tokyo), Yoshiki Koshiyama (Tokyo), Takeshi Nishikawa (Tokyo), Miki Fukugami (Tokyo), Ayumi Tanaka (Tokyo) and Takayuki Yanagisawa (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A gas barrier film comprising a resin base material, an oxygen barrier coating provided on at least one surface of the resin base material, and a base layer and/or an inorganic oxide layer provided between the resin base material and the oxygen barrier coating, wherein the black area ratio of one surface ...