ALEXANDRIA, Va., April 9 -- United States Patent no. 12,269,241, issued on April 8, was assigned to TOPPAN INC. (Tokyo).
"Gas barrier film" was invented by Miki Fukugami (Tokyo) and Kaoru Furuta (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A gas barrier film including: a substrate layer containing polypropylene; a resin layer containing a copolymer of propylene and another monomer; a vapor deposition layer of an inorganic oxide; and a gas barrier layer, laminated in this order, wherein the vapor deposition layer has a thickness of 5 nm to 300 nm, the resin layer has a thickness of 0.3 micro metre or more, and a surface of the resin layer facing the vapor deposition layer has at least one softening t...