ALEXANDRIA, Va., June 4 -- United States Patent no. 12,320,593, issued on June 3, was assigned to TOP RANK TECHNOLOGY Ltd. (Apia, Samoa).
"Integrated vapor chamber" was invented by Tien-Lai Wang (Apia, Samoa), Tzu-Yu Wang (Apia, Samoa), Cheng-Yu Wang (Apia, Samoa) and Meng-Yu Lee (Apia, Samoa).
According to the abstract* released by the U.S. Patent & Trademark Office: "An integrated vapor chamber includes a metallic top cover, a metallic bottom cover, a working space, capillary structures and a working fluid in the working space. The top cover includes oppositely an outer heat-dissipating surface and an inner condensation surface surrounded by a top frame. The inner condensation surface has parallel top grooves and protrusive supporting s...