US Patent Issued to TOKYO OHKA KOGYO on Sept. 30 for "Cleaning liquid used for cleaning metal resists, and cleaning method using cleaning liquid" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,428,737, issued on Sept. 30, was assigned to TOKYO OHKA KOGYO Co. LTD. (Kawasaki, Japan).

"Cleaning liquid used for cleaning metal resists, and cleaning method using cleaning liquid" was invented by Mai Sugawara (Kawasaki, Japan) and Tomoya Kumagai (Kawasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metal resist remover containing a solvent and a strong acid that is liquid at 20deg C., in which a pH value, which is measured with a pH meter, of a liquid formed by subjecting the cleaning liquid to a 10-fold dilution with pure water is 2.5 or less."

The patent was filed on Dec. 7, 2022, under Application No. 18/062,841.

*For further inform...