US Patent Issued to TOKYO OHKA KOGYO on Nov. 18 for "Resist composition, method of forming resist pattern, compound, and acid diffusion controlling agent" (Japanese Inventor)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,637, issued on Nov. 18, was assigned to TOKYO OHKA KOGYO Co. LTD. (Kawasaki, Japan).

"Resist composition, method of forming resist pattern, compound, and acid diffusion controlling agent" was invented by KhanhTin Nguyen (Kawasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition containing a base material component and a compound represented by General Formula (d0), in which in the formula, Rd0 represents a condensed cyclic group containing a condensed ring containing at least one aromatic rings, the condensed cyclic group having, as a substituent, an acid decomposable group which is decomposed under action of acid to form a...