US Patent Issued to TOKYO OHKA KOGYO on Jan. 13 for "Nanoimprint composition and pattern forming method" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,523,930, issued on Jan. 13, was assigned to TOKYO OHKA KOGYO Co. LTD. (Kawasaki, Japan).

"Nanoimprint composition and pattern forming method" was invented by Kenri Konno (Kawasaki, Japan) and Risako Mori (Kawasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A nanoimprint composition including an unsaturated acid metal salt (R), a photopolymerizable compound (B), a photoradical polymerization initiator, and a solvent component having compatibility with the unsaturated acid metal salt (R) and the photopolymerizable compound (B), in which a content of the unsaturated acid metal salt (R) is 50 parts by mass or greater with respect to 100 parts by ...