US Patent Issued to TOKYO OHKA KOGYO on Dec. 2 for "Film cleaning solution and method for cleaning film" (Japanese Inventor)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,485,387, issued on Dec. 2, was assigned to TOKYO OHKA KOGYO Co. LTD. (Kanagawa, Japan).

"Film cleaning solution and method for cleaning film" was invented by Isao Hirano (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A film cleaning solution that contains a solvent and a metal removing agent, in which two or more kinds of the solvents are contained, and a distance between a Hansen solubility parameter of the film cleaning solution and a Hansen solubility parameter of dimethylacetamide is 1.0 or less."

The patent was filed on Nov. 17, 2021, under Application No. 18/252,770.

*For further information, including images, charts and tables, ...