US Patent Issued to Tokyo Electron on Sept. 9 for "Substrate inspection apparatus, substrate inspection method, and recording medium" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,413,832, issued on Sept. 9, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate inspection apparatus, substrate inspection method, and recording medium" was invented by Daisuke Kajiwara (Koshi, Japan), Tadashi Nishiyama (Koshi, Japan) and Hiroshi Tomita (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate inspection apparatus configured to inspect a substrate with an image obtained by imaging a surface of the substrate includes a holder 31 configured to hold the substrate; a first light source unit 51 configured to emit visible light to the substrate held by the holder 31; a second light source unit 52 configured to emit infrare...