US Patent Issued to Tokyo Electron on Sept. 9 for "Plasma processing with magnetic ring X point" (Texas Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,748, issued on Sept. 9, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing with magnetic ring X point" was invented by Barton Lane (Austin, Texas) and Peter Lowell George Ventzek (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma etching system that includes a plasma processing chamber, a substrate holder disposed in the plasma processing chamber, a RF power source configured to generate a plasma in the plasma processing chamber, a first magnet disposed above the substrate holder, the first magnet configured to apply, in the plasma processing chamber, an azimuthally symmetric magnetic field that is independent from ...