US Patent Issued to Tokyo Electron on Sept. 9 for "Plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,732, issued on Sept. 9, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus" was invented by Kazushi Kaneko (Yamanashi, Japan), Satoru Kawakami (Yamanashi, Japan) and Eiki Kamata (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus comprises a processing chamber accommodating a substrate, and defining a processing space by an upper wall, a side wall, and a lower wall, a microwave generator configured to generate a microwave for generating plasma, a plurality of microwave radiators provided above the upper wall, and configured to radiate the microwave toward the processing chamber, a pl...