US Patent Issued to Tokyo Electron on Sept. 9 for "Method and apparatus for determining cause of abnormality in a semiconductor manufacturing chamber" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,479, issued on Sept. 9, was assigned to Tokyo Electron Ltd. (Tokyo).

"Method and apparatus for determining cause of abnormality in a semiconductor manufacturing chamber" was invented by Kazushi Shoji (Sapporo, Japan), Shintaro Saruwatari (Sapporo, Japan), Nobutoshi Terasawa (Sapporo, Japan) and Motokatsu Miyazaki (Sapporo, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An information processing apparatus detects an abnormality sign in a semiconductor manufacturing apparatus. The apparatus includes: a sensor data collector configured to acquire sensor waveform data represented with respect to a sensor value axis and a time axis measured by a s...