ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,427,451, issued on Sept. 30, was assigned to Tokyo Electron Ltd. (Tokyo).
"Vacuum assisted filtration" was invented by Corey Lemley (Albany, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of supplying a processing solution includes shutting off a feed line supplying the processing solution to a chemical filter, installing a dry chemical filter in a filter housing of the chemical filter, closing an output line from the filter housing to a nozzle configured to dispense the processing solution (either before or after installing the dry chemical filter), applying a vacuum to the filter housing while the feed line remains shut, and opening the...