US Patent Issued to Tokyo Electron on Sept. 30 for "Substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,384, issued on Sept. 30, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus" was invented by Koichi Shimada (Oshu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes: a first boat configured to hold substrates in a shelf shape; a second boat provided coaxially with the first boat and configured to hold substrates in a shelf shape; and a drive configured to rotate the first boat and the second boat in a synchronized manner and configured to raise and lower the second boat relative to the first boat."

The patent was filed on July 20, 2022, under Application No. 17/869,096.

*For f...